CTI OB 8FE 8116071G001 低温泵
AMAT ENDURA PVD: 0190-13334 3Ph
AMAT ENDURA PVD: 0190-13369 3Ph
The enhanced On-Board 8F Cryopump maintains fast recovery performance longer, for fewer regenerations, in both argon and nitrogen/argon-based sputtering. The figures illustrate its recovery performance for both process types, using a target recovery pressure of 1 x 10-7 Torr.
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